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A brief introduction to quartz crucibles

A brief introduction to quartz crucibles

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Quartz crucible can be used below 1450 degrees. It is divided into two kinds: transparent and opaque. The translucent quartz crucible fabricated by arc method is the basic material for drawing large diameter monocrystalline silicon and developing large-scale integrated circuits. Today, the world's semiconductor industry developed countries have replaced the small transparent quartz crucible with this crucible. He has high purity and strong heat resistance, large size high precision, good heat insulation, energy saving, stable quality etc..
In addition to HF, ordinary dilute inorganic acids can be used as cleaning solutions. Quartz crucibles used for drawing monocrystalline silicon in China are 18 inches and 20 inches 22 inches. There are also 22 or more crucibles used by manufacturers. At present, the crucible technology produced by large crucible manufacturers in China is quite mature. Its production and use of raw materials, quartz sand imported by the United States and Norway high purity quartz sand two. There are also small factories using homemade materials. The quartz crucibles produced by their raw materials have certain influence on the stability of the drawn monocrystalline silicon.The current production of crucible coating technique has been used by most manufacturers is in ordinary quartz sand solution for crucible surface coated with a layer of two barium oxide solution so as to form a dense layer, the dense layer can prevent the silicon and silicon high temperature quartz crucible drawing process to improve reaction rate.
The quartz crucible is suitable for melting samples with K2S2O7, KHSO4 as flux, and using Na2S207 (first drying at 212 degrees) to treat samples with flux.
HF can not contact, high temperature, easy and effect of carbonate caustic alkali metal.

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