What is the difference between the purpose of wafer cleaning and the cleaning of silicon material, what is the difference between the acid used
A technique used to reduce the reflectivity of silicon, which is cleaned only by hydrofluoric acid
The silicon wafer cleaning is also known as the production of wool, chemical etching of silicon wafer surface, so that the light area
You say that the silicon wafer cleaning is not the same as that of the silicon material, and the silicon material is washed with hydrofluoric acid
