How much is the surface roughness of 285nm silicon dioxide wafer after polishing?
How much is the surface roughness of 285nm silicon dioxide wafer after polishing?
Widely used in many materials, nano scale high planarization polishing. Such as: silicon wafer, compound crystal, precision optical device, precious stone polishing processing.
Silicon oxide polishing fluid [1] is a kind of high-purity and low metal ion polishing product made of high-purity silica fume as a raw material and produced by special process.