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Question:

How much is the surface roughness of 285nm silicon dioxide wafer after polishing?

How much is the surface roughness of 285nm silicon dioxide wafer after polishing?

Answer:

How much is the surface roughness of 285nm silicon dioxide wafer after polishing?
Widely used in many materials, nano scale high planarization polishing. Such as: silicon wafer, compound crystal, precision optical device, precious stone polishing processing.
Silicon oxide polishing fluid [1] is a kind of high-purity and low metal ion polishing product made of high-purity silica fume as a raw material and produced by special process.

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