What is the effect of CMP polishing pressure on polishing effect?
CMP, that is, Chemical, Mechanical, Polishing, chemical mechanical polishing.
CMP equipment and consumables include: polishing machine, polishing slurry, polishing pad, after CMP cleaning equipment, polishing endpoint detection and process control equipment, waste treatment and testing equipment. The concept of CMP technology was first proposed by Monsanto in 1965.
