Ultrasonic cleaning cleaning silicon?
3, the silicon wafer cleaning is very important in semiconductor manufacturing process, and the cleaning plate is the most difficult of all cleaning process. Due to the use of silicon ultrasonic cleaning machine, penetration through the physical, the pollution particles from the wafer surface, through mechanical and chemical corrosion of ultrasonic cleaning, the final removal of pollution particles, reached the purpose of wafer cleaning.
1, silicon wafer wafer ultrasonic cleaning function.2, cleaning the wafer production process, pollutants using ultrasonic cleaning machine effectively remove organic matter, wafer surface particles and metal impurities, natural oxide layer and quartz, plastic containers and accessories, the wafer surface damage characteristics. According to different cleaning process, the corresponding cleaning unit is equipped with independent control.
Yes, but it is said to be the frequency of the 1MHz cleaning machine. Is not an ordinary low-frequency 100K below the frequency of cleaning machine.
