How much acid does silica use to become mesoporous silica?
We used 30% hydrofluoric acid to etch the sample in an ultrasonic environment. In this case, it is necessary to seal the container, because the concentration of 30% hydrofluoric acid is relatively high, and the volatility is stronger. You can have a try
It is not difficult to use hydrofluoric acid to remove silica. The main point is that the concentration is suitable, the temperature is 80-85 degrees, the mixing speed is right, the reaction time is about four hours. The container must be opened, and the ventilation of the overflow pot should be paid attention to
